Last edited by Daishakar
Sunday, April 26, 2020 | History

2 edition of Silicon device performance measurements to support temperature range enhancement found in the catalog.

Silicon device performance measurements to support temperature range enhancement

Silicon device performance measurements to support temperature range enhancement

semi-annual report May 7, 1992 - November 9, 1992

by

  • 60 Want to read
  • 35 Currently reading

Published by Auburn University, Center for the Commercial Development of Space Power, National Aeronautics and Space Administration, National Technical Information Service, distributor in Auburn, AL, [Washington, D.C, [Springfield, Va .
Written in

    Subjects:
  • Semiconductors -- Effect of temperature on.,
  • Silicon -- Effect of temperature on.,
  • Space ships -- Equipment and supplies.

  • Edition Notes

    Statementprepared by James Bromstead ... [et al.].
    Series[NASA contractor report -- NASA CR-191957., NASA contractor report -- NASA CR-191957.
    ContributionsBromstead, James., United States. National Aeronautics and Space Administration.
    The Physical Object
    FormatMicroform
    Pagination1 v.
    ID Numbers
    Open LibraryOL14693623M

    and temperature drift coefficients than shunt references. Thus, if you need better than percent initial accuracy and/or less than 25ppm/°C temperature drift, you will most likely need a series voltage reference. However, shunt references offer more flexibility in terms of VIN range, as well as the option to stack multiple devices on top ofFile Size: 5MB. Book of Abstracts Fourth Workshop Role of Point Defects/Defect Complexes in Silicon Device Processing June , Beaver Creek, Colorado National Renewable Energy Laboratory Cole Boulevard Golden, Colorado Operated by Midwest Research Institute for the U.S. Department of Energy Under Contract No. DE-ACCH The figure indicates that the values obtained are almost constant in the larger thickness range in this study at any oxidation temperature. The reason for this constant thickness dependence is that, in the case of Si-face, interfacial reaction rate-limiting step continues up to several μ m in oxide thickness, as revealed in Sec. Cited by: 5.


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Silicon device performance measurements to support temperature range enhancement Download PDF EPUB FB2

Temperature variations in the device parameters must be quantified in order to implement extended temperature range operation. The fundemental device physics indicates silicon devices should operate with some variation in device parameters over a temperature range from °C to over oc.

Silicon device performance measurements to support temperature range enhancement Article (PDF Available) June Silicon device performance measurements to support temperature range enhancement book 33 Reads How we measure 'reads'. SILICON DEVICE PERFORMANCE MEASUREMENTS TO SUPPORT TEMPERATURE RANGE ENHANCEMENT Cooperative Agreement NCC NASA Lewis Research Center Cleveland, Ohio Semi-Annual Report May 7, - November 7, Prepared by" James Bromstead Bennett Weir.=" R.

Wayne Johnson, Principal Investigator Ray Askew, Principal. Silicon device performance measurements to support temperature range enhancement Article (PDF Available) April with 15 Reads How we measure 'reads'.

SILICON DEVICE PERFORMANCE MEASUREMENTS TO SUPPORT TEMPERATURE RANGE ENHANCEMENT Cooperative Agreement NCC NASA Lewis Research Center Cleveland, Ohio /0 Semi-Annual Report May 7, -November Silicon device performance measurements to support temperature range enhancement book, Prepared by: James Bromstead Bennett Weir Melvin Cosby R.

Wayne Johnson, Principal Investigator R. Mark. Silicon device performance measurements to support temperature range enhancement - NASA/ADS Silicon based Silicon device performance measurements to support temperature range enhancement book devices can be used at C.

The device measurements made during this program show a predictable shift in device parameters with increasing : James Bromstead, Bennett Weir, R.

Mark Nelms, R. Wayne Johnson, Ray Askew. The maximum specified rise time for the 2N is l_s and the maximum specified fall time is also l_ts. The values measured at 20°C, VCE rise time of ns and a VCE fall time of ns, fall well within the maximums specified by the manufacturer.

SILICON DEVICE,PERFORMANCE MEASUREMENTS TO SUPPORT TEMPERATURE RANGE ENHANCEMENT Cooperative Agreement NCC c_,c_H -'_. NASA Lewis Research Center Cleveland, Ohio f,ip Y Annual Report May 7, - May 6, Prepared by: James Bromstead Bennett Weir R. Wayne Johnson, Principal Investigator Ray Askew.

In most cases, the device is derated to zero operating power at C. At the high temperature end of the temperature range, the intrinsic carrier concentration increases to equal the doping concentration level and the silicon behaves as an intrinsic by: 1.

Get this from a library. Silicon device performance measurements to support temperature range enhancement: semi-annual report May 7, - November 9, [James Bromstead; United States. National Aeronautics and Space Administration.;]. Silicon device performance measurements to support temperature range enhancement.

By R. Mark Nelms, Ray Askew, Bennett Weir, James Bromstead and R. Wayne Johnson. Abstract. Silicon based power devices can be used at C.

The device measurements made during this program show a predictable shift in device parameters with increasing temperature. The results of the NPN bipolar transistor (BJT) (2N) breakdown voltage measurements were analyzed. Switching measurements were made on the NPN BJT, the insulated gate bipolar transistor (IGBT) (TA) and the N-channel metal oxide semiconductor field effect transistor (MOSFET) (RFH75N05E).

Efforts were also made to build a H-bridge inverter. Silicon device performance measurements to support temperature range enhancement - NASA/ADS Characterization results of a MOS controlled thyristor (MCTA60P60) are presented.

This device is rated for 60A and for an anode to cathode voltage of V. As discussed in the last report, the MCT failed during V Silicon device performance measurements to support temperature range enhancement book tests at by: 1.

Silicon device performance measurements to support temperature range enhancement: Authors: Johnson, R Metal Oxide Semiconductors, Silicon, Switching Circuits, Voltage Converters (Dc To Dc), Electrical Measurement, Inverters, Switching: Also discussed are the plans that have been made to do life testing on the devices, to build an.

A prototype to V converter was built and is being tested at room temperature. The control loop is being finalized. Temperature stable, high value (10 micro-F) capacitors appear to be the limiting factor in the design at this by: 1.

Get this from a library. Silicon device performance measurements to support temperature range enhancement: semi-annual report, May 7, - November 7, [James Bromstead; Lewis Research Center.;].

Get this from a library. Silicon device performance measurements to support temperature range enhancement. [James Bromstead; United States. National Aeronautics and Space Administration.;]. Recalling the discussion regarding the f(E) with E − E F plot at 0 K and 10 K, now increasing the temperature to K, the range of energies (E − E F) for transition from f(E) = 1 to f(E) = 0 broadens to ±10 × eV = ± eV and more carriers become available.

With a further increase in temperature to K, the range spreads more. Silicon is a group IV element in the periodic table and is a semiconductor with a bandgap of eV, which means that pure silicon at room temperature is almost an insulator.

By doping with group III or group V elements, the resistivity of silicon can be varied over a wide range. The band gap of single crystal silicon is eV at room temperature. Silicon becomes semitransparent at wavelengths longer than μm [].In some instances, the emissivity measurement of Si meets some challenges at μm because the radiant energy from the heater penetrates the wafer and is detected by the radiometer, causing interference.

High Performance Silicon Imaging is an excellent resource for both academics and engineers working in the optics, photonics, semiconductor, and electronics industries. Show less High Performance Silicon Imaging covers the fundamentals of silicon image sensors, with a focus on existing performance issues and potential solutions.

Influence of the operating temperature on the performance of silicon based photoelectrochemical devices for water splitting Article in Materials Science in Semiconductor Processing The leakage current I CBO is strongly temperature-dependent, doubling for every 10 °C increase of temperature.

As the temperature increases, I CBO increases and collector current I C climbs appreciably by a factor of (β + 1)I uent upon this steep rise in collector current I C, the transistor is heated, increasing I C still further through the heating effect.

Silicon clean impact on 90nm CMOS devices performance. for 65nm CMOS Device Performance Enhancement. Article.

sup> cm-2 is annealed over a wide range of temperature (from to. The strong modifi- cation of the mobility law at low temperature has been emphasized. The observation of velocity overshoot as the device is scaled down has been illustrated for /~m N MOS devices. The influence of the impurity freeze-out which occurs at low temperature, has also been by: Table 1.

represents an example for enhancement of monocrystalline silicon solar cell performance by using some of these solution. Table 1. The short-circuit current and open-circuit voltage of mono-Si solar cell with different types of chemical solution filtration and glass cover (Tl = mm) at mW/cm 2, AM by: 2.

Spin Lifetime Enhancement by Shear Strain in Thin Silicon-On-Insulator Films Conference Paper in ECS Transactions 53(5) May with 6 Reads How we measure 'reads'.

Xie, R., Ishijima, N., Sugime, H. et al. Enhancing the photovoltaic performance of hybrid heterojunction solar cells by passivation of silicon surface via a Cited by: 1.

At the other end of the temperature range, the oscillator frequency underwent small decrease as it dropped to MHz at + °C, as shown in Figure 1. A typical waveform of the oscillator output obtained over the wide temperature range is shown in Figure 2.

Figure 1. Variation in oscillator output frequency with temperature. Figure 2. Characteristics of device A, the Al–N-implanted TFET with a channel length of 60 nm. (a) Log-scale dI D /dV S map at 40 Coulomb diamonds exhibit the maximum widths at V G = V and −0 Cited by: 5.

Warburton, R. et al. Ge-on-Si single-photon avalanche diode detectors: design, modeling, fabrication, and characterization at wavelengths and nm. IEEE Trans. Electron Dev. 60, Cited by: 5. Limited performance and reliability of electronic devices at extreme temperatures, intensive electromagnetic fields, and radiation found in space exploration missions (i.e., Venus & Jupiter Cited by: An example of a temperature dependence measurement for a passivated silicon solar cell is shown in Fig.

These data have been normalized to 25°C (the standard measurement temperature) so that all three parameters appear on the same scale. As seen here, the temperature dependence over the normal device operating range. a, Measurement width W is mm, the distance between the voltage electrodes L is mm and the lateral distance between the current injecting electrode and the Hall electrodes D is Cited by:   For thermal conductivity measurements, Au-coated silicon nitride (Si 3 N 4) substrates with µm diameter holes were used instead of SiO 2 /Si.

For electrical and thermoelectric measurements, the graphene films were patterned by oxygen plasma, yielding microchannels with width and length of 5 µ m and 10 µ m, by: Silicon nanowires with narrowly distributed diameters of 20−30 nm have been fabricated by chemical vapor deposition on an anodized aluminum oxide (AAO) substrate.

The first-order and second-order Raman scatterings of the silicon nanowires have been studied in a temperature range from to K. Both of the first-order and second-order Raman peaks were found to Cited by: • Three main versions exists today: – Bluetooth BR/EDR (Bluetooth classic) • This is Bluetooth as we mostly know it today – Bluetooth low energy (Bluetooth Smart / Bluetooth ) • Ultra low power version of Bluetooth meant for low power sensors and accessories • Not suitable for audio today – Bluetooth High Speed Technology • Bluetooth meant for high speed data transmission.

Capacitance–voltage profiling (or C–V profiling, sometimes CV profiling) is a technique for characterizing semiconductor materials and devices. The applied voltage is varied, and the capacitance is measured and plotted as a function of voltage.

The technique uses a metal–semiconductor junction (Schottky barrier) or a p–n junction or a MOSFET to create a. Atomically thin tungsten diselenide (WSe 2) has emerged as a promising material for the next generation electronic and optoelectronicwe report an enhancement of WSe 2 photodetector performance via surface functionalization with molybdenum trioxide (MoO 3).Strong hole doping from MoO 3 to WSe 2 was revealed by in situ field-effect transistor device Cited by: 2.

LEDs, the Si/42/M01 is capable of supporting multiple-axis proximity motion detection. The Si/42/M01 devices are provided in a lead xx mm QFN package and are capable of operation from to V over the –40 to +85 °C temperature range. Integrated infrared proximity detector Proximity detection adjustable from.

A new substrate for surface-enhanced Pdf spectroscopy has been developed in the form of pdf nanotips, by electron cyclotron resonance plasma chemical vapor deposition, with apex diameters of ∼2 nm, lengths of nm, and densities of /cm2. The surface areas of the nanotips are ∼ m2cm-3, comparable with the best-quality porous silicon.

Ion-beam Cited by: Silicon Designs, Inc., a % veteran download pdf and U.S. based global industry leader in the design, development and manufacture of highly rugged industrial-grade MEMS variable capacitive accelerometer chips, modules and supporting data acquisition, announced the recently enhanced performance of its compact, low-mass, single axis Model series.

Design of the .Characterization and Failure Analysis of Silicon Devices Current and Future Dieter K. Ebook Device in quiescent state A range in quiescent state device/circuit performance Can measure thousands of gates simultaneously or observe one gateFile Size: KB.